ASML Unveils EUV High-NA Lithography Exposure Equipment for Advanced Wafer Production Technology

In the wafer manufacturing process, exposure machines are very important. ASML of the Netherlands is a leading company in this field. It has recently officially unveiled EUV High-NA lithography exposure equipment to further improve wafer production technology. ASML has finally revealed to the outside world its next generation TWINSCAN EXE:5000 exposure machine (lithography machine), which […]
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